Reactive ion beam machining of diamond using an ECR-type oxygen source

Nanotechnology

Volumn 7, Issue 3, 1996, Pages 270-274

  Kiyohara, Shuji ^a   Miyamoto, Iwao ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON CYCLOTRON RESONANCE; ION BEAMS; OXYGEN; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS; SURFACE ROUGHNESS;

KAUFMAN APPARATUS; REACTIVE ION BEAM MACHINING (RIBM);

SEMICONDUCTING DIAMONDS;

EID: 0030232914     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/7/3/017     Document Type: Article

References (10)

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