Electrical properties of integrated Ta2O5 metal-insulator-metal capacitors

Materials Research Society Symposium - Proceedings

Volumn 500, Issue , 1998, Pages 101-106

  Martin, B C ^a   Basceri, C ^a   Streiffer, S K ^a   Kingon, A I ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; CURRENT DENSITY; DIELECTRIC RELAXATION; ELECTRIC PROPERTIES; INTEGRATED CIRCUIT LAYOUT; LEAKAGE CURRENTS; MIS DEVICES; REACTIVE ION ETCHING; SPUTTER DEPOSITION;

LEAKAGE CURRENT DENSITY; POOLE-FRENKEL MECHANISM;

CAPACITORS;

EID: 0032292096     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)