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Volumn 18, Issue 4 II, 2000, Pages 1613-1618
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Surface morphology analysis in correlation with crystallinity of CeO2(110) layers on Si(100) substrates
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CRYSTAL ORIENTATION;
ELECTRON BEAMS;
EPITAXIAL GROWTH;
EVAPORATION;
MORPHOLOGY;
REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;
SILICON WAFERS;
SURFACE STRUCTURE;
THIN FILMS;
CERIA;
ELECTRON BEAM-ASSISTED EVAPORATION;
CERIUM COMPOUNDS;
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EID: 0034226197
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.582395 Document Type: Article |
Times cited : (4)
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References (16)
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