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Volumn 477, Issue , 1997, Pages 321-326
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Effect of electron incidence in epitaxial growth of CeO2(110) layers on Si(100) substrates
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRIC CURRENTS;
ELECTRON BEAMS;
EPITAXIAL GROWTH;
EVAPORATION;
FILM GROWTH;
SEMICONDUCTING SILICON;
SUBSTRATES;
VACUUM;
ELECTRON BEAM ASSISTED EVAPORATION;
ELECTRON INCIDENCE;
CERIUM COMPOUNDS;
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EID: 0031347271
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-474-321 Document Type: Conference Paper |
Times cited : (9)
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References (14)
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