Very low contrast X-ray masks for high resolution printing

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 275-278

  Chen, Y ^a   Simon, G ^a   Haghiri Gosnet, A M ^a   Manin, L ^a   Launois, H ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; NUMERICAL ANALYSIS; SYNCHROTRON RADIATION; X RAY LITHOGRAPHY;

HIGH RESOLUTION PRINTING; VERY LOW CONTRAST;

MASKS;

EID: 0031702331     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00063-X     Document Type: Article

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