Combination of nanoimprint and scanning force lithography for local tailoring of sidewalls of nanometer devices

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 221-224

  Schulz, H ^a   Korbes A S ^a   Scheer, H C ^a   Balk, L J ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLICS; COPOLYMERS; ELECTRON BEAM LITHOGRAPHY; MICROSCOPIC EXAMINATION; NANOTECHNOLOGY; THERMAL EFFECTS;

NANOIMPRINT LITHOGRAPHY; SCANNING FORCE LITHOGRAPHY; SCANNING LASER MICROSCOPE;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0034206374     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00301-4     Document Type: Article

References (8)

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