Dual-plasma reactor for low temperature deposition of wide band-gap silicon alloys

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 2, 1997, Pages 320-331

  Etemadi, R ^a   Godet, C ^a   Perrin, J ^a   Drevillon B ^a   Huc, J ^a   Parey, J Y ^a   Rostaing, J C ^b   Coeuret, F ^b  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^b AIR LIQUIDE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031488040     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580487     Document Type: Article

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