Effect of substrate temperature on the deposition of C-N films by pulsed high-temperature C-H-N plasma CVD

Thin Solid Films

Volumn 360, Issue 1-2, 2000, Pages 52-55

  Jiang, Ying Bing ^a   Zhang, Hong Xia ^a   Cheng, Da Jun ^a   Yang, Si Ze ^a  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; HARDNESS; HIGH TEMPERATURE APPLICATIONS; HIGH TEMPERATURE EFFECTS; HYDROGEN; METHANE; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES; SYNTHESIS (CHEMICAL);

CARBON NITROGEN FILMS; HIGH TEMPERATURE PLASMA; PULSED HIGH TEMPERATURE PLASMA CHEMICAL VAPOR DEPOSITION; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 0034140268     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00572-6     Document Type: Article

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