Deposition of carbon nitride films by vacuum ion diode with explosive emission

Thin Solid Films

Volumn 308-309, Issue 1-4, 1997, Pages 233-238

  Korenev, Sergey A ^a,b   Perry, Anthony J ^c   Elkind, Alexander ^d   Kalmukov, Alexander ^b  

^a NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

^b JOINT INSTITUTE FOR NUCLEAR RESEARCH   (Russian Federation)

^c AIMS Mktg 10921 Corte Calandria   (United States)

^d UNIVERSITY OF MICHIGAN   (United States)

Author keywords

Carbon nitride films; Explosive emission; Vacuum ion deposition

Indexed keywords

CRYSTAL GROWTH; SPUTTER DEPOSITION; STRUCTURE (COMPOSITION); SYNTHESIS (CHEMICAL);

AMORPHOUS MATRIX; SEQUENTIAL DEPOSITION;

AMORPHOUS FILMS;

EID: 0031250229     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00424-0     Document Type: Article

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