Optimization of the chemical mechanical polishing process for premetal dielectrics

Journal of the Electrochemical Society

Volumn 147, Issue 2, 2000, Pages 682-686

  Fang, Simon J ^a,b   Garza, Santos ^a   Guo, Honglin ^a   Smith, Taber H ^a   Shinn, Greg B ^a   Campbell, John E ^a   Hartsell, Michelle L ^a  

^a TEXAS INSTRUMENTS   (United States)

^b UNITED MICROELECTRONICS CORPORATION   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; DEFECTS; GLASS; OPTIMIZATION; OXIDES; PHOTOLITHOGRAPHY; PRESSURE; SPEED;

CHEMICAL MECHANICAL POLISHING; PHOSPHOSILICATE GLASS; PREMETAL DIELECTRIC; ULTRAVIOLET LITHOGRAPHIC PROCESS;

DIELECTRIC MATERIALS;

EID: 0034139958     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393253     Document Type: Article

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