Microstructural characterization of N, Ti mixed coatings deposited by plasma based ion implantation and magnetron sputtering deposition

Journal of Materials Science Letters

Volumn 19, Issue 8, 2000, Pages 635-638

  Ma, Xinxin ^a   Che, Renchao ^a   Sun, Mingren ^a   Sun, Yue ^a   Xia, Lifang ^a   Li, Xiaodong ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; ION BOMBARDMENT; ION IMPLANTATION; MAGNETRON SPUTTERING; PARTICLE SIZE ANALYSIS; PLASMA SOURCES; POLYCRYSTALLINE MATERIALS; SPUTTER DEPOSITION; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA SOURCE ION IMPLANTATION (PSII);

CERAMIC COATINGS;

EID: 0033902107     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1006790006750     Document Type: Article

References (13)

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