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Volumn 93, Issue 2-3, 1997, Pages 292-296

Noble metal cathodic arc implantation for corrosion control of Ti-6A1-4V

Author keywords

Biomaterials; Corrosion; Ion implantation; Plasma

Indexed keywords

BIOMATERIALS; ELECTRIC VARIABLES MEASUREMENT; ION IMPLANTATION; IRIDIUM; PASSIVATION; PLASMAS; POLARIZATION; SECONDARY ION MASS SPECTROMETRY; SURFACE TREATMENT;

EID: 0031225190     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00063-7     Document Type: Article
Times cited : (15)

References (22)
  • 12
    • 0042590116 scopus 로고
    • Technical Information Pub. 3846, Richards Manufacturing Company
    • Richards Manufacturing Company, Biophase Implant Material, Technical Information Pub. 3846, Richards Manufacturing Company, 1980, p. 7.
    • (1980) Biophase Implant Material , pp. 7
  • 19
    • 0043090879 scopus 로고
    • Plasma potential and ion density measurements in a curved magnetic separation duct utilized in a pulsed cathodic arc metal ion implantation system
    • Sydney, Australia
    • S. Meassick, H. Champaign, Plasma Potential and Ion Density Measurements in a Curved Magnetic Separation Duct Utilized in a Pulsed Cathodic Arc Metal Ion Implantation System, Proceeding of the Second International Workshop on Plasma-based Implantation, Sydney, Australia, 1995.
    • (1995) Proceeding of the Second International Workshop on Plasma-based Implantation
    • Meassick, S.1    Champaign, H.2
  • 22
    • 0043090881 scopus 로고    scopus 로고
    • Courtesy of Implant Sciences Corporation
    • Courtesy of Implant Sciences Corporation.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.