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Volumn 69, Issue , 2000, Pages 132-135
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Applications of a novel method for determining the rate of production of photochemical porous silicon
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Author keywords
[No Author keywords available]
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Indexed keywords
ETCHING;
INTERFACES (MATERIALS);
IRRADIATION;
LASER BEAM EFFECTS;
PHOTOCHEMICAL REACTIONS;
POROUS SILICON;
REACTION KINETICS;
TRANSPORT PROPERTIES;
HYDROGEN FLUORIDE;
LASER IRRADIATION;
SEMICONDUCTING SILICON;
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EID: 0033896447
PISSN: 09215107
EISSN: None
Source Type: Journal
DOI: 10.1016/S0921-5107(99)00410-9 Document Type: Article |
Times cited : (7)
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References (19)
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