Laser-induced formation of visible light emitting silicon

Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 457-462

  Dimova Malinovska, D ^a   Tzolov, M ^a   Malinowski, N ^b,d   Marinova, Ts ^c   Krastev, V ^c  

^a CTRL LAB SOLAR ENER NEW ENER S   (Bulgaria)

^b MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

^c INSTITUTE OF GENERAL AND INORGANIC CHEMISTRY   (Bulgaria)

^d CENTRAL LABORATORY OF PHOTOPROCESSES   (Bulgaria)

Author keywords

Laser induced etching; Photoluminescence; Porous silicon

Indexed keywords

BONDING; ETCHING; GAS LASERS; INFRARED SPECTROSCOPY; IRRADIATION; LASER APPLICATIONS; LASER BEAMS; LIGHT EMISSION; NEODYMIUM LASERS; PHOTOLUMINESCENCE; SILICON WAFERS;

ARGON LASER INDUCED STAIN ETCHING; CHEMICAL BONDING; LASER INDUCED FORMATION; LASER IRRADIATION; NEODYMIUM YTTRIUM ALUMINUM GARNET; VISIBLE LIGHT EMITTING SILICON;

POROUS SILICON;

EID: 0030562893     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00458-0     Document Type: Article

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