Growth and characterisation of amorphous carbon films doped with nitrogen

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 161-163, Issue , 2000, Pages 969-974

  Barradas, N P ^a,c   Khan, R U A ^a   Anguita, J V ^a   Silva, S R P ^a   Kreissig, U ^b   Grotzschel R ^b   Moller W ^b  

^a UNIVERSITY OF SURREY   (United Kingdom)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^c INSTITUTO TECNOLÓGICO E NUCLEAR   (Portugal)

Author keywords

Amorphous hydrogenated carbon; Nitrogen doped amorphous carbon; Rutherford backscattering; Simulated annealing

Indexed keywords

CARBON; CHEMICAL BONDS; COMPOSITION; ELECTRODES; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HEAVY IONS; HELIUM; HYDROGEN; METHANE; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

FOURIER TRANSFORM INFRARED ANALYSIS; HEAVY ION ELASTIC RECOIL DETECTION ANALYSIS; HYDROGENATED AMORPHOUS CARBON THIN FILMS; NITROGEN FLOW; NITROGENATION;

AMORPHOUS FILMS;

EID: 0033893947     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00770-3     Document Type: Article

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