Fabrication of low-stress dielectric thin-film for microsensor applications

IEEE Electron Device Letters

Volumn 18, Issue 12, 1997, Pages 599-601

  Chou, Bruce C S ^a,b   Shie, Jin Shown ^b   Chen, Chung Nan ^b  

^a IEEE   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; FABRICATION; SILICON WAFERS; SUBSTRATES;

LOW STRESS DIELECTRIC THIN FILM; MICROSENSOR;

THIN FILMS;

EID: 0031333120     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.644083     Document Type: Article

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