Physical properties of carbon nitride films synthesized using atomic transport reactions

Surface and Coatings Technology

Volumn 125, Issue 1-3, 2000, Pages 278-283

  Popov, C ^a   Plass, M F ^a   Zambov, L ^a   Bulir, J ^b   Delplancke Ogletree, M P ^b   Kulisch, W ^a  

^a UNIVERSITY OF KASSEL   (Germany)

^b UNIVERSITÉ LIBRE DE BRUXELLES   (Belgium)

Author keywords

Bonding structure; Carbon nitride; Composition; ICP CVD

Indexed keywords

CARBON INORGANIC COMPOUNDS; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; MOLECULAR STRUCTURE; NITRIDES; PLASMA APPLICATIONS; SURFACE ROUGHNESS; SYNTHESIS (CHEMICAL); THIN FILMS;

ATOMIC TRANSPORT REACTIONS; CARBON NITRIDE; INDUCTIVELY COUPLED PLASMA CHEMICAL VAPOR DEPOSITION (ICP-CVD);

PROTECTIVE COATINGS;

EID: 0033882384     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00573-3     Document Type: Article

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