A synthetic approach to RF plasma modeling verified by experiments: Demonstration of a predictive and complete plasma simulator

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 4 SUPPL. B, 1997, Pages 2435-2442

  Gogolides, Evangelos ^a  

^a INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

Author keywords

CF4 plasma; CH4 plasma; Diamond like carbon deposition; Plasma modeling simulation; Plasma process modeling simulation; Si etching

Indexed keywords

DIAMOND LIKE CARBON (DLC) FILMS;

DEPOSITION; DIAMOND FILMS; ELECTRODES; ITERATIVE METHODS; MATHEMATICAL MODELS; PLASMA SIMULATION; SILICON WAFERS;

PLASMA ETCHING;

EID: 0031118172     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.2435     Document Type: Review

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