Influence of the deposition parameters on the characteristics of CuxMo6S8 thin films in situ grown by pulsed laser deposition

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 72, Issue 1, 2000, Pages 47-55

  Lemee N ^a,c   Guilloux Viry, M ^a   Perrin, A ^b   Lalu, F ^b   Lesueur, J ^b  

^a Laboratoire de Chimie du Solide et Inorganique Moleculaire de Rennes   (France)

^b 91405 Orsay Campus   (France)

^c Grenoble INP Phelma   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; DEPOSITION; EPITAXIAL GROWTH; FILM GROWTH; MAGNETIC SUSCEPTIBILITY; PULSED LASER APPLICATIONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS; SUPERCONDUCTING TRANSITION TEMPERATURE; THIN FILMS; X RAY CRYSTALLOGRAPHY;

CHEVREL PHASES; PULSED LASER DEPOSITION (PLD);

COPPER COMPOUNDS;

EID: 0033874798     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(00)00377-9     Document Type: Article

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