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Volumn 29, Issue 5, 2000, Pages 603-606
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Comparison between TiAl and TiAlNiAu ohmic contacts to n-type GaN
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
ATOMIC FORCE MICROSCOPY;
EVAPORATION;
METALLIZING;
MORPHOLOGY;
OHMIC CONTACTS;
SURFACE ROUGHNESS;
THERMODYNAMIC STABILITY;
TITANIUM COMPOUNDS;
X RAY PHOTOELECTRON SPECTROSCOPY;
CONTACT RESISTIVITY;
ELECTRON-BEAM EVAPORATION;
SEMICONDUCTING GALLIUM COMPOUNDS;
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EID: 0033750657
PISSN: 03615235
EISSN: None
Source Type: Journal
DOI: 10.1007/s11664-000-0052-1 Document Type: Article |
Times cited : (37)
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References (11)
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