Stress reduction by ion bombardment in CeO2 films

Solid State Communications

Volumn 114, Issue 11, 2000, Pages 613-616

  Wang, Rong Ping ^a   Pan, Shao Hua ^a   Zhou, Yue Liang ^b  

^a CCAST WORLD LABORATORY   (China)

^b INSTITUTE OF PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CERIUM COMPOUNDS; DEPOSITION; ION BOMBARDMENT; NICKEL; PULSED LASER APPLICATIONS; SUBSTRATES; THERMAL EFFECTS; THERMAL STRESS; X RAY DIFFRACTION ANALYSIS;

PULSED LASER DEPOSITION;

THIN FILMS;

EID: 0033747164     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1098(00)00072-7     Document Type: Article

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