Electron field emission from amorphous carbon thin films as a function of annealing

Surface and Coatings Technology

Volumn 108-109, Issue , 1998, Pages 577-582

  Forrest, R D ^a   Burden, A P ^a   Khan, R U A ^a   Silva, S R P ^a  

^a UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

Amorphous carbon; Annealing; Field emission; Semiconductors

Indexed keywords

ANNEALING; CARBON; ELECTRON EMISSION; HYDROGENATION; MATHEMATICAL MODELS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SUBSTRATES; THIN FILMS;

AMORPHOUS CARBON; FOWLER-NORDHEIM ANALYSIS;

AMORPHOUS FILMS;

EID: 0032183431     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00597-0     Document Type: Article

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