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Volumn 44, Issue 7, 2000, Pages 1163-1168

Low temperature microcrystalline silicon thin film resistors on glass substrates

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ANALYSIS; CRYSTALLINE MATERIALS; DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRON CYCLOTRON RESONANCE; SEMICONDUCTING GLASS; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; SUBSTRATES; THIN FILMS;

EID: 0033735087     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(00)00057-5     Document Type: Article
Times cited : (6)

References (10)
  • 4
    • 0028480008 scopus 로고
    • Integrated processing of amorphous and microcrystalline Si thin film transistors by plasma assisted chemical vapor deposition
    • Lucovsky G., He S.S., Williams M.J., Stephens D. Integrated processing of amorphous and microcrystalline Si thin film transistors by plasma assisted chemical vapor deposition. Microelectron Engng. 25:1994;329-336.
    • (1994) Microelectron Engng , vol.25 , pp. 329-336
    • Lucovsky, G.1    He, S.S.2    Williams, M.J.3    Stephens, D.4
  • 7
    • 78649789534 scopus 로고    scopus 로고
    • Assessment of as-deposited mirocrystalline silicon films on polymer substrates using electron cyclotron resonance plasma-enhanced chemical vapor deposition
    • Bae S., Fonash S.J. Assessment of as-deposited mirocrystalline silicon films on polymer substrates using electron cyclotron resonance plasma-enhanced chemical vapor deposition. J Vac Sci Technol. A17:1999;1987-1990.
    • (1999) J Vac Sci Technol , vol.17 , pp. 1987-1990
    • Bae, S.1    Fonash, S.J.2
  • 8
    • 0000139945 scopus 로고    scopus 로고
    • Characterisitcs of amorphous and polycrystalline silicon films deposited at 120°C by electron cyclotron resonance plasma-enhanced chemical vapor deposition
    • Bae S., Kalkan A., Cheng S., Fonash S. Characterisitcs of amorphous and polycrystalline silicon films deposited at 120°C by electron cyclotron resonance plasma-enhanced chemical vapor deposition. J Vac Sci Technol. A16(3):1998;1912-1916.
    • (1998) J Vac Sci Technol , vol.16 , Issue.3 , pp. 1912-1916
    • Bae, S.1    Kalkan, A.2    Cheng, S.3    Fonash, S.4
  • 9
    • 0031168978 scopus 로고    scopus 로고
    • Optical and transport studies on thin microcrystalline silicon films prepared by very high frenquency glow discharge for solar cell applications
    • Tzolov M., Finger F., Carius R., Hapke P. Optical and transport studies on thin microcrystalline silicon films prepared by very high frenquency glow discharge for solar cell applications. J Appl Phys. 81:1997;7376-7385.
    • (1997) J Appl Phys , vol.81 , pp. 7376-7385
    • Tzolov, M.1    Finger, F.2    Carius, R.3    Hapke, P.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.