Interface-treated Josephson junctions in trilayer structures

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 39, Issue 3 A/B, 2000, Pages

  Maruyama, Michitaka ^a   Yoshida, Kazuhiro ^a   Furutani, Toshiki ^a   Inagaki, Yukitoshi ^a   Horibe, Masahiro ^a   Inoue, Masumi ^a   Fujimaki, Akira ^a   Hayakawa, Hisao ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRIC CONDUCTIVITY OF SOLIDS; INTERFACES (MATERIALS); LOW TEMPERATURE OPERATIONS; MAGNETIC FIELDS; MAGNETRON SPUTTERING; PHOTOLITHOGRAPHY; REACTIVE ION ETCHING; SEMICONDUCTING FILMS; SEMICONDUCTOR DEVICE STRUCTURES; SUBSTRATES; YTTRIUM BARIUM COPPER OXIDES;

ARGON ION ETCHING; INTERFACE TREATMENT; NATURAL BARRIER; RESISTIVELY SHUNTED JUNCTION TYPE CHARACTERISTICS; TRILAYER STRUCTURES;

JOSEPHSON JUNCTION DEVICES;

EID: 0033734224     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.l205     Document Type: Article

References (8)

1. B. H. Moeckly and K. Char: Appl. Phys. Lett. 71 (1997) 2526.
2. T. Satoh, M. Hidaka and S. Tahara: IEEE Trans. Appl. Supercond. 9 (1999) 3141.
3. B. D. Hunt, Martin G. Forrester, J. Talvacchino and R. M. Young: IEEE Trans. Appl. Supercond. 9 (1999) 3362.
4. A. Fujimaki, K. Kawai, N. Hayashi, M. Horibe, M. Maruyama and H. Hayakawa: IEEE Trans. Appl. Supercond. 9 (1999) 3436.
5. R. Dittmann, J.-K. Heinsohn, A. I. Braginski and C. L. Jia: IEEE Trans. Appl. Supercond. 9 (1999) 3440.
6. Y. Huang, K. L. Merkle, B. H. Moeckly and K. Char: Physica C 314 (1999) 36.
7. J. G. Wen, T. Satoh, M. Hidaka, S. Tahara and N. Koshizuka: Proc. Int. Workshop on Superconductivity, Hawaii, 1999. p. 99.
8. L. I. Glazman and K. A. Matveev: Sov. Phys. JETP 67 (1988) 1276.