Fabrication of yba2cu3o7 ramp-type junctions by interface treatments

IEEE Transactions on Applied Superconductivity

Volumn 9, Issue 2 PART 3, 1999, Pages 3440-3443

  Dittmann, R ^a   Heinsohn, J K ^a   Braginski, A I ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; ELECTRIC RESISTANCE; ETCHING; INTERFACES (MATERIALS); MAGNETIC FIELD EFFECTS; MATHEMATICAL MODELS; OXIDE SUPERCONDUCTORS; SUPERCONDUCTING FILMS; THERMAL EFFECTS;

BARRIER LAYERS; INTERFACE TREATMENTS; ION BEAM ETCHING; RAMP TYPE JUNCTIONS; SHAPIRO STEP HEIGHT;

JOSEPHSON JUNCTION DEVICES;

EID: 0032663497     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/77.783769     Document Type: Article

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