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Volumn 5, Issue 3, 1996, Pages 510-513

Plasma assisted evaporation of palladium

(6) Laure, Claude a Braultf, Pascal a Thomman, Anne Lise a Boswell, Rod b Rousseau, Bernard c Estrade Szwarckopf, Henriette c

a UNIVERSITÉ D'ORLÉANS (France)

b AUSTRALIAN NATIONAL UNIVERSITY (Australia)

c Centre National de la Recherche Scientifique (France)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CRYSTAL GROWTH; ELECTRIC DISCHARGES; EMISSION SPECTROSCOPY; EVAPORATION; NUCLEATION; PALLADIUM; PHOTOELECTRON SPECTROSCOPY; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; SPUTTER DEPOSITION;

HIGH FREQUENCY ARGON PLASMA;

PLASMA APPLICATIONS;

EID: 0030204557 PISSN: 09630252 EISSN: None Source Type: Journal
DOI: 10.1088/0963-0252/5/3/018 Document Type: Article

Times cited : (11)

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