Ion beam synthesis of buried oxide layers in silicon carbide

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 166, Issue , 2000, Pages 390-394

  Ishimaru, Manabu ^a,b   Dickerson, Robert M ^a   Sickafus, Kurt E ^a  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

^b KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CHEMICAL BONDS; CRYSTAL MICROSTRUCTURE; ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY DISPERSIVE SPECTROSCOPY; ION BEAMS; ION IMPLANTATION; OXIDES; OXYGEN; SEMICONDUCTING SILICON COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

ION BEAM SYNTHESIS;

SILICON CARBIDE;

EID: 0033729287     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)01057-5     Document Type: Article

References (10)

1. K. Izumi, MRS Bull. 23 (1998) 20.
2. Liu Y.M., Prucnal P.R. IEEE Photonics Technol. Lett. 5:1993;704.
3. Jackson S.M., Reed G.T., Reeson K.J. Electron. Lett. 31:1995;1438.
4. Barradas N.P., Jeynes C., Jackson S.M. Nucl. Instr. and Meth. B. 136/138:1998;1168.
5. Wesch W., Heft A., Hobert H., Peiter G., Wendler E., Bachmann T. Nucl. Instr. and Meth. B. 141:1998;160.
6. Ishimaru M., Dickerson R.M., Sickafus K.E. Appl. Phys. Lett. 75:1999;352.
7. M. Ishimaru, R.M. Dickerson, K.E. Sickafus, Proceedings of Microscopy and Microanalysis 99, 1999, p. 770.
8. Ishimaru M., Sickafus K.E. Appl. Phys. Lett. 75:1999;1392.
9. Egerton R.F. Electron Energy-Loss Spectroscopy in the Electron Microscope. 1996;Plenum, New York.
10. Ishimaru M., Tsunemori T., Harada S., Arita M., Motooka T. Nucl. Instr. and Meth. 148:1999;311.