Planar ion channeling study of subsurface damage in polished CdS

CIRP Annals - Manufacturing Technology

Volumn 49, Issue 1, 2000, Pages 443-446

  Lucca, D A ^a   Maggiore, C J ^b   Klopfstein, M J ^a  

^a OKLAHOMA STATE UNIVERSITY   (United States)

^b LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; CRYSTAL LATTICES; CRYSTAL ORIENTATION;

PLANAR ION CHANNELING;

SEMICONDUCTING CADMIUM COMPOUNDS;

EID: 0033721939     PISSN: 00078506     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0007-8506(07)62985-0     Document Type: Article

References (10)

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10. Picraux, S.T., Rimini, E., Foti, G., Campisano, S.U., 1978, Dechanneling by Dislocations in Ion-Implanted AI, Phys. Rev. B, 18, 5: 2078-2096.