Plasma associated diamond nucleation on AlN in hot-filament chemical vapor deposition

Materials Letters

Volumn 44, Issue 6, 2000, Pages 336-340

  Wang, W L ^a   Liao, K J ^a   Zhang, R Q ^b  

^a CHONGQING UNIVERSITY   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; NUCLEATION; PLASMA APPLICATIONS; SURFACES;

ALUMINUM NITRIDE; BIAS CURRENT; NEGATIVE BIAS VOLTAGE; PLASMA ASSOCIATED DIAMOND NUCLEATION;

ALUMINUM COMPOUNDS;

EID: 0033721465     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(00)00055-0     Document Type: Article

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