Depth profiling of ultrashallow B implants in silicon using a magnetic-sector secondary ion mass spectrometry instrument

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 1, 2000, Pages 519-523

  Napolitani, E ^a   Carnera, A ^a   Storti, R ^a   Privitera, V ^b   Priolo, F ^c   Mannino, G ^c   Moffatt, S ^d  

^a UNIVERSITY OF PADOVA   (Italy)

^b CNR   (Italy)

^c UNIVERSITY OF CATANIA   (Italy)

^d APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; SECONDARY ION MASS SPECTROMETRY;

CRYSTALLINE SILICON; ULTRALOW ENERGY IMPLANTS;

SILICON WAFERS;

EID: 0033700333     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591224     Document Type: Article

References (14)

1. National Technology Roadmap for Semiconductors (Semiconductor Industry Association, San Jose, 1997).
2. V. Privitera, E. Napolitani, F. Priolo, S. Moffatt, A. La Magna, G. Mannino, A. Carnera, and A. Picariello, Mater. Sci. Semicond. Process. 2, 35 (1999)
3. M. G. Dowsett, N. S. Smith, R. Bridgeland, D. Richards, A. C. Lovejoy, and P. Pedrick, Secondary Ion Mass Spectrometry, SIMS X (Wiley, New York, 1997), p. 367.
4. Z.-X. Jiang, P. F. A. Alkemade, E. Algra, and S. Radelaar, Surf. Interface Anal. 25, 285 (1997).
5. K. Iltgen, C. Bendel, E. Niehuis, and A. Benninghoven, Secondary Ion Mass Spectrometry, SIMS X (Wiley, New York, 1997), p. 375.
6. M. Schuhmacher, B. Rasser, and D. Renard, Secondary Ion Mass Spectrometry, SIMS XI (Wiley, New York, 1998), p. 695.
7. J. G. M. van Berkum, E. J. H. Collart, K. Weemers, D. J. Gravesteijn, K. Iltgen, A. Benninghoven, and E. Niehuis, J. Vac. Sci. Technol. B 16, 298 (1998).
8. P. C. Zalm, Rep. Prog. Phys. 58, 1321 (1995).
9. S. Moffatt, XI International Conference on Ion Implantation Technology (IIT'96), 1997, p. 5.
10. K. Wittmaack and S. F. Corcoran, J. Vac. Sci. Technol. B 16, 272 (1998).
11. R. G. Wilson, F. A. Stevie, and C. W. Magee, Secondary Ion Mass Spectrometry (Wiley, New York, 1989), p. 1.3-1.
12. 2 beam, using the procedure described in Napolitani et al. (unpublished).
13. J. Cardenas and B. G. Svensson, Secondary Ion Mass Spectrometry, SIMS XI (Wiley, New York, 1998), p. 335.
14. E. Napolitani, A. Camera, E. Schroer, V. Privitera, F. Priolo, and S. Moffatt, Appl. Phys. Lett. 75, 1869 (1999).