Mechanical and chemical properties of CBxNy and CSixNy thin films grown by N*-plasma assisted pulsed laser depositon

Materials Research Society Symposium - Proceedings

Volumn 593, Issue , 2000, Pages 541-546

  Tharigen T ^a   Riede, V ^a   Lippold, G ^b   Hartmann, E ^b   Hesse, R ^a   Streubel, P ^a   Lorenz, D ^c   Grau, P ^c   Lorenz, M ^a  

^a UNIVERSITY OF LEIPZIG   (Germany)

^b LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

^c MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; BOND STRENGTH (CHEMICAL); COMPOSITION; DEPOSITION; FILM GROWTH; MECHANICAL PROPERTIES; MECHANICAL VARIABLES MEASUREMENT; PULSED LASER APPLICATIONS; THICKNESS MEASUREMENT; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

BINDING STRUCTURE; CARBON BORON NITRIDE; CARBON SILICON NITRIDE; PULSED LASER DEPOSITION;

NITRIDES;

EID: 0033698649     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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