Deposition and properties of highly (100)-oriented barium titanate thin films on LaNiO3 electrode

Ceramics International

Volumn 26, Issue 6, 2000, Pages 599-603

  Wu, Tai Bor ^a   Shy, Hsiou Jeng ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; CRYSTALLIZATION; ELECTRIC POTENTIAL; ELECTRODES; EPITAXIAL GROWTH; LANTHANUM COMPOUNDS; LEAKAGE CURRENTS; MAGNETRON SPUTTERING; PERMITTIVITY; SPUTTER DEPOSITION; THIN FILMS;

LANTHANUM NICKEL OXIDE;

BARIUM TITANATE;

EID: 0033689185     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0272-8842(99)00103-0     Document Type: Article

References (10)

1. Abe R., Komatsu S. J. Appl. Phys. 77:1995;6461.
2. Nakamura T., Yamanaka Y., Morimoto A., Shimizu T. Jpn. J. Appl. Phys. 34:1995;5150.
3. Kawahara T., Yamamuka M., Yuuki A., Ono K. Jpn. J. Appl. Phys. 35:1996;4880.
4. Wu T.B., Wu C.M., Chen M.L. Appl. Phys. Lett. 69:1996;2659.
5. Hoffmann S., Waser R. Integrated Ferroelectrics. 17:1997;141.
6. Tsukada M., Mukaida M., Miyazawa S. Jpn. J. Appl. Phys. 35:1996;4908.
7. Ichinose H., Shiwa Y., Nagano M. Jpn. J. Appl. Phys. 33:1994;5903.
8. Yang C.C., Chen M.S., Hong T.J., Wu C.M., Wu J.M., Wu T.B. Appl. Phys. Lett. 66:1995;2643.
9. Chen M.S., Wu J.M., Wu T.B. Jpn. J. Appl. Phys. 34:1995;4870.
10. Tseng T.F., Liu K.S., Wu T.B., Lin I.N. Appl. Phys. Lett. 68:1996;2505.