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Applied Surface Science

Volumn 108, Issue 2, 1997, Pages 283-288

IR laser induced CVD of SiO 2 phases from triethoxysilane and tetraethoxysilane

(4) Drinek V a Bastl, Z b Subrt J c Pola, J a

a INSTITUTE OF CHEMICAL PROCESS FUNDAMENTALS (Czech Republic)

b J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY (Czech Republic)

c INSTITUTE OF INORGANIC CHEMISTRY (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; FILMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GASES; IMPURITIES; INFRARED RADIATION; LASER APPLICATIONS; SUBSTRATES; THERMAL EFFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

BATCH REACTORS; FLOW REACTORS; TETRAETHOXYSILANE; TRIETHOXYSILANE;

SILICA;

EID: 0031075834 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(97)80018-9 Document Type: Article

Times cited : (5)

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