Deposition of BaTiO3 thin films by plasma MOCVD

Thin Solid Films

Volumn 300, Issue 1-2, 1997, Pages 6-10

  Chiba, Takashi ^a   Itoh, Ken Ichi ^a   Matsumoto, Osamu ^a  

^a AOYAMA GAKUIN UNIVERSITY   (Japan)

Author keywords

Dielectric properties; Organometallic vapor deposition; Plasma processing and deposition; Surface and interface states

Indexed keywords

ATOMS; BARIUM TITANATE; ELLIPSOMETRY; INFRARED SPECTROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLECULES; PERMITTIVITY; PLASMA APPLICATIONS; SILICON WAFERS; SUBSTRATES; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

BARIUM DIPIVALOYL-METHANATE; TITANIUM TETRAISOPROPOXIDE;

THIN FILMS;

EID: 0031146888     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09506-5     Document Type: Article

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