Hydrogenated amorphous silicon photoresists for HgCdTe patterning

Materials Research Society Symposium - Proceedings

Volumn 467, Issue , 1997, Pages 961-966

  Hollingsworth, R E ^a   DeHart, C ^a   Wang, Li ^a   Dinan, J H ^a   Johnson, J N ^a  

^a Materials Research Group Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; ELECTRON CYCLOTRON RESONANCE; HYDROGEN; MERCURY COMPOUNDS; OXIDATION; PHOTORESISTS; PLASMA ETCHING; SILANES; VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

HYDROGENATED AMORPHOUS SILICON; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

AMORPHOUS FILMS;

EID: 0031331336     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-467-961     Document Type: Conference Paper

References (5)