Properties of a-Si:H films deposited from silane diluted with hydrogen and helium using modified pulse plasma technique

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 6, 1999, Pages 3202-3208

  Mukherjee, C ^a,b   Anandan, C ^a   Seth, C ^a,c   Dixit, P N ^a   Bhattacharyya, R ^a  

^a NATIONAL PHYSICAL LABORATORY   (India)

^b CAT   (India)

^c C MET   (India)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033463727     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582043     Document Type: Article

References (28)

1. J. P. M. Schmitt, Mater. Res. Soc. Symp. Proc. 219, 631 (1991).
2. T. Hamasaki, M. Ueda, A. Chayahara, M. Hirose, and Y. Osaka, Appl. Phys. Lett. 44, 1049 (1984).
3. A. Shah, J. Dutta, N. Wyrsch, K. Prasad, H. Curtins, F. Finger, A. Howling, and Ch. Hollenstein, Mater. Res. Soc. Symp. Proc. 258, 15 (1992).
4. L. J. Overzet, J. H. Beberman, and J. T. Verdeyen, J. Appl. Phys. 66, 1622 (1989).
5. L. J. Overzet and J. T. Verdeyen, Appl. Phys. Lett. 48, 695 (1986).
6. Y. Watanabe, M. Shiratani, Y. Kubo, I. Ogawa, and S. Ogi, Appl. Phys. Lett. 53, 1263 (1988).
7. T. Yoshida, Y. Ichikawa, and H. Sakai, Proceeding of the 9th EC-PVSEC (Freiburg), edited by W. Pabs et al. (1989), p. 1006.
8. Y. Hishikawa, S. Tsuda, K. Wakisaka, and Y. Kuwano, J. Appl. Phys. 73, 4227 (1993).
9. Y. Watanabe, M. Shiratani, and H. Makino, Appl. Phys. Lett. 57, 1616 (1990).
10. G. Bruno, P. Capezzuto, G. Cicala, and P. Manodoro, Mater. Res. Soc. Symp. Proc. 204, 289 (1991).
11. A. A. Howling, Ch. Hollenstein, J-L. Dorier, P. Paris, and M. Fabre, Proceedings of the 10th EC-PVSEC (Lisbon), edited by A. Lugue et al. (1991), p. 169.
12. A. Bouchoule, A. Plain, L. Boufendi, PH. J. Bloudean, and C. Laure, J. Appl. Phys. 70, 1991 (1991).
13. A. Madan and S. Morrision, Sol. Energy Mater. Sol. Cells 55, 127 (1998).
14. C. Anandan, C. Mukherjee, T. Seth, P. N. Dixit, and R. Bhattacharyya, Appl. Phys. Lett. 66, 85 (1995).
15. C. Mukherjee, C. Anandan, T. Seth, P. N. Dixit, and R. Bhattacharyya, Appl. Phys. Lett. 68, 835 (1996).
16. C. Mukherjee, C. Anandan, T. Seth, P. N. Dixit, and R. Bhattacharyya, Appl. Phys. Lett. 68, 194 (1996).
17. J. C. Knights, R. A. Lujian, M. P. Rosenblum, R. A. Street, D. K. Beigleson, and R. A. Reimer, Appl. Phys. Lett. 38, 331 (1981).
18. P. Roca i Cabarrocas, Y. Bouizem, and M. L. Theye, Philos. Mag. B 65, 1025 (1992).
19. C. B. Fleddermann, J. H. Beberman, and J. T. Verdeyen, J. Appl. Phys. 58, 1344 (1985).
20. S. Vignoli, R. Meaudre, M. Meaudre, L. Chanel, and P. Roca i Cabarrocas, J. Non-Cryst. Solids 164-166, 191 (1993).
21. R. Meaudre, M. Meaudre, S. Vignoli, P. Roca i Cabarrocas, and M. L. Theye, Philos. Mag. B 67, 497 (1993).
22. T. Seth, P. N. Dixit, O. S. Panwar, and R. Bhattacharyya, Sol. Energy Mater. Sol. Cells 31, 215 (1993).
23. G. Oversluizen and W. H. M. Lodders, J. Appl. Phys. 83, 8002 (1998).
24. P. Roca i Cabarrocas and A. Lloret, Appl. Phys. A: Solids Surf. 58, 365 (1994).
25. J. P. Kleider, C. Longe, and P. Roca i Cabarrocas, J. Non-Cryst. Solids 164-166, 403 (1993).
26. S. Mashima, G. Ganguli, and A. Matsuda, Plasma Sources Sci. Technol. 2, 23 (1993).
27. G. Ganguly and A. Matsuda, Mater. Res. Soc. Symp. Proc. 336, 7 (1994).
28. E. A. G. Hamers, W. G. J. H. M. Van Sark, J. Bezmer, W. F. Van der Weg, and W. J. Goedheer, Mater. Res. Soc. Symp. Proc. 420, 46 (1996).