Composition and structure of HCl-isopropanol treated and vacuum annealed GaAs(100) surfaces

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 5, 1999, Pages 2655-2662

  Tereshchenko, O E ^a   Chikichev, S I ^a   Terekhov, A S ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033459928     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581926     Document Type: Article

References (31)

1. R. P. Vasquez, B. F. Lewis, and F. J. Grunthaner, J. Vac. Sci. Technol. B 1, 791 (1983).
2. A. Saletes, J. Massies. and J. P. Countour, Jpn. J. Appl. Phys., Part 2 25, L48 (1986).
3. Y. G. Galitsin, V. G. Mansurov, V. I. Poshevnev, and A. S. Terekhov, Poverkhnost 10, 140 (1989).
4. Y. G. Galitsin, V. G. Mansurov, V. I. Poshevnev, and A. S. Terekhov, Poverkhnost 4, 147 (1989).
5. M.-G. Kang, S.-H. Sa, H.-H. Park, K.-S. Sun, and K.-H. Oh, Thin Solid Films 308-309, 634 (1997).
6. Z. Song, S. Shogen, M. Kawasaki, and I. Suemune, Appl. Surf. Sci. 82/83, 250 (1994); J. Vac. Sci. Technol. B 13, 77 (1995).
7. Z. Song, S. Shogen, M. Kawasaki, and I. Suemune, Appl. Surf. Sci. 82/83, 250 (1994); J. Vac. Sci. Technol. B 13, 77 (1995).
8. M. Koinuma and K. Uosaki, Surf. Sci. 311, L737 (1994).
9. S. Osakabe and S. Adachi, Jpn. J. Appl. Phys., Part 1 36, 7119 (1997).
10. H. Yao, S.-L. Yau, and K. Itaya, Appl. Phys. Lett. 68, 1473 (1996).
11. J. M. Woodall, P. Oelhafen, T. N. Jackson, J. L. Freeouf, and G. D. Pettit, J. Vac. Sci. Technol. B 1, 795 (1989).
12. Z. H. Lu, C. Lagarde, E. Sacher, J. F. Currie, and A. Yelon, J. Vac. Sci. Technol. A 7, 646 (1989).
13. S. Matsumoto, S. Yamaga, and A. Yoshikawa, Appl. Surf. Sci. 60/61, 274 (1992).
14. Z. Wang, S. Kwan, T. P. Pearsall, J. L. Booth, B. T. Beard, and S. R. Johnson, J. Vac. Sci. Technol. B 15, 116 (1997).
15. C. D. Thurmond, J. Electrochem. Soc. 122, 1133 (1975).
16. V. L. Alperovich, V. M. Zaletin, A. F. Kravchenko, and A. S. Terekhov, Phys. Status Solidi B 77, 465 (1976).
17. P. Drathen, W. Ranke, and K. Jacobi, Surf. Sci. 77. L162 (1978).
18. A. A. Aquino and T. S. Jones, Appl. Surf. Sci. 104/105, 304 (1996).
19. Y. Chen. J. Schmidt, L. Siller, J. C. Barnard, and R. E. Palmer, Phys. Rev. B 58, 1177 (1998).
20. L. H. Dubois and G. P. Schwartz, Phys. Rev. B 26, 794 (1982).
21. M. Nooney, V. Liberman, M. Xu, A. Ludiksson, and R. M. Martin, Surf. Sci. 302. 192 (1994).
22. J. Massies and J. P. Contour, J. Appl. Phys. 58, 806 (1985).
23. Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy, edited by D. Briggs and M. P. Seah (Wiley, New York, 1983).
24. I. M. Vitomirov, A. Raisanen, A. C. Finnefrock, R. E. Viturro, L. J. Brillson, P. D. Kirchner, G. D. Pettit, and J. M. Woodall, Phys. Rev. B 46, 13293 (1992).
25. H. Grant and W. Mönch, Surf. Sci. 105, 217 (1981).
26. C. W. Snyder, J. Sudijono, C.-H. Lam, M. D. Johnson, and B. G. Orr, Phys. Rev. B 50, 18194 (1994).
27. W. Chen, M. Dumas, D. Mao, and A. Kahn, J. Vac. Sci. Technol. B 10, 1886 (1992).
28. C. Deparis and J. Massies, J. Cryst. Growth 108, 157 (1991).
29. D. K. Biegelsen, R. D. Bringans, J. E. Northrup, and L.-E. Swartz, Phys. Rev. B 41, 5701 (1990).
30. I. Chizhov, G. Lee, R. F. Willis, D. Lubyshev, and D. L. Miller, Appl. Surf. Sci. 123/124, 192 (1998).
31. A. J. Van Bommel, J. E. Crombeen, and T. G. J. Van Oirschot, Surf. Sci. 72, 95 (1978).