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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 12 A, 1997, Pages 7119-7125

Study of GaAs(001) surfaces treated in aqueous HCl solutions

(2) Osakabe, Shinya a Adachi, Sadao a

a GUNMA UNIVERSITY (Japan)

Author keywords

AFM; Chemical etching; Cl termination; GaAs; Native oxide; Spectroscopic ellipsometry; Surface roughness

Indexed keywords

ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; ELLIPSOMETRY; ETCHING; HYDROCHLORIC ACID; MORPHOLOGY; OXIDES; REGRESSION ANALYSIS; SOLUTIONS; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

OXIDE FILM; SPECTROELLIPSOMETRY;

SEMICONDUCTING GALLIUM ARSENIDE;

EID: 0031355733 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.36.7119 Document Type: Article

Times cited : (42)

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