Co L3,2-edge and multi-detection channel XAFS studies of Co-Si interactions

Journal of Synchrotron Radiation

Volumn 6, Issue 3, 1999, Pages 526-528

  Naftel, S J ^a   Sham, T K ^a  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

Author keywords

Co L edge; Cobalt silicide; Fluorescence yield; Thin films; Total electron yield

Indexed keywords

EID: 0033423159     PISSN: 09090495     EISSN: None     Source Type: Journal    
DOI: 10.1107/S0909049599000989     Document Type: Article

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