X-ray absorption fine structure (XAFS) studies of cobalt silicide thin films

Materials Research Society Symposium - Proceedings

Volumn 524, Issue , 1998, Pages 273-277

  Naftel, S I ^a   Coulthard, I ^a   Hu, Y ^a   Sham, T K ^a   Zinke Allmang, M ^a  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT COMPOUNDS; ELECTROMAGNETIC WAVE ABSORPTION; ELECTRONIC STRUCTURE; FILM PREPARATION; FLUORESCENCE; MORPHOLOGY; SILICON WAFERS; SPUTTER DEPOSITION; THIN FILMS; X RAY SPECTROSCOPY;

COBALT SILICIDE; X RAY ABSORPTION FINE STRUCTURE (EXAFS) SPECTROSCOPY; X RAY ABSORPTION NEAR EDGE STRUCTURE (XANES) SPECTROSCOPY;

SEMICONDUCTING FILMS;

EID: 0031640995     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-524-273     Document Type: Conference Paper

References (5)