Effect of hidden parameters for the plasma CVD synthesis of diamond films

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 428-439

  Deuerler, Friedericke ^a   Buck, Volker ^b   Peterseim, Jürgen ^c   Gruner, Heiko ^d  

^a UNIVERSITY OF WUPPERTAL   (Germany)

^b UNIVERSITY OF DUISBURG ESSEN   (Germany)

^c MÜNSTER UNIVERSITY OF APPLIED SCIENCES   (Germany)

^d MEDICOAT AG   (Switzerland)

Author keywords

Diamond film; Low pressure synthesis; Plasma jet chemical vapour deposition; Process parameters; Tools

Indexed keywords

ADHESION; CARBIDE TOOLS; DRY ETCHING; MACHINING; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PREHEATING; SCANNING ELECTRON MICROSCOPY; STEEL; SURFACE ROUGHNESS; SYNTHESIS (CHEMICAL); X RAY CRYSTALLOGRAPHY;

PLASMA JET CHEMICAL VAPOR DEPOSITION;

DIAMOND FILMS;

DIAMOND COATING; PLASMA TREATMENT; TOOL; VAPOR DEPOSITION;

EID: 0033381655     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00288-1     Document Type: Conference Paper

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