Nondestructive analytical tools for characterization of thin titanium silicide films prepared by conventional and direct step silicidation with enhanced transition

Journal of the Electrochemical Society

Volumn 146, Issue 9, 1999, Pages 3440-3447

  Kal, S ^a   Ryssel, H ^b  

^a INDIAN INSTITUTE OF TECHNOLOGY   (India)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELLIPSOMETRY; FILM PREPARATION; LIGHT REFLECTION; NONDESTRUCTIVE EXAMINATION; PERMITTIVITY; REFRACTIVE INDEX; SPECTROSCOPIC ANALYSIS; SURFACE ROUGHNESS; THIN FILMS; TITANIUM COMPOUNDS;

SILICIDATION; SPECTROSCOPIC ELLIPSOMETRY; TITANIUM SILICIDE;

SEMICONDUCTING FILMS;

EID: 0033363622     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1392493     Document Type: Article

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