Noncontacting measurement of thickness of thin titanium silicide films using spectroscopic ellipsometer

IEEE Electron Device Letters

Volumn 19, Issue 4, 1998, Pages 127-130

  Kal, S ^a   Kasko, I ^b   Ryssel, H ^b,c  

^a INDIAN INSTITUTE OF TECHNOLOGY   (India)

^b FRAUNHOFER INSTITUTE FOR INTEGRATED CIRCUITS IIS   (Germany)

^c UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; NONDESTRUCTIVE EXAMINATION; SEMICONDUCTING SILICON COMPOUNDS; THICKNESS MEASUREMENT; THIN FILMS; TITANIUM COMPOUNDS;

SPECTROSCOPIC ELLIPSOMETERS; TITANIUM SILICIDE;

SEMICONDUCTING FILMS;

EID: 0032048106     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.663536     Document Type: Article

References (7)

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