Photoluminescence of samarium-doped aluminosilicate thin films deposited by RF sputtering with a ceramic target

Journal of the Ceramic Society of Japan

Volumn 107, Issue 8, 1999, Pages 707-710

  Futagami, Toshiro ^a,c   Kamei, Masayuki ^a,d   Yasui, Itaru ^a   Sugimoto, Naoki ^b   Hayashi, Yasuo ^b   Hayashi, Atsushi ^b  

^a INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

^b ASAHI GLASS CO LTD   (Japan)

^c OSAKA NATIONAL RESEARCH INSTITUTE   (Japan)

^d NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Aluminosilicate; Aluminum; Cosputtering; Photoluminescence; Rf sputtering; Samarium; Silicon oxide; Thin film

Indexed keywords

ALUMINUM COMPOUNDS; CERAMIC MATERIALS; DOPING (ADDITIVES); HOT PRESSING; LIGHT ABSORPTION; MAGNETRON SPUTTERING; PHOTOLUMINESCENCE; SAMARIUM; SILICA; SILICATES; SPUTTER DEPOSITION; THERMAL EFFECTS;

MICROWAVE DIELECTRIC CERAMICS;

OPTICAL FILMS;

EID: 0033357376     PISSN: 09145400     EISSN: None     Source Type: Journal    
DOI: 10.2109/jcersj.107.707     Document Type: Article

References (8)

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