Persistent spectral hole burning in samarium and aluminum codoped silica films prepared by RF sputtering

Journal of the Ceramic Society of Japan

Volumn 107, Issue 5, 1999, Pages 494-496

  Futagami, Toshiro ^a   Kamei, Masayuki ^a   Yasui, Itaru ^a   Shigesato, Yuzo ^b   Sugimoto, Naoki ^c   Hayashi, Yasuo ^c  

^a INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

^b AOYAMA GAKUIN UNIVERSITY   (Japan)

^c ASAHI GLASS CO LTD   (Japan)

Author keywords

Aluminosilicate; Aluminum; Persistent spectral hole burning; Photoluminescence; RF sputtering; Samarium; Silicon oxide; Thin film

Indexed keywords

ALUMINA; DOPING (ADDITIVES); LIGHT ABSORPTION; PHOTOLUMINESCENCE; RADIOFREQUENCY SPECTROSCOPY; SAMARIUM; SILICA; THERMAL EFFECTS; THIN FILMS;

PERSISTENT SPECTRAL HOLE BURNING;

CERAMIC MATERIALS;

EID: 0032642538     PISSN: 09145400     EISSN: None     Source Type: Journal    
DOI: 10.2109/jcersj.107.494     Document Type: Article

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