Theoretical estimation of absorption coefficients of various polymers at 13 nm

Journal of Photopolymer Science and Technology

Volumn 12, Issue 4, 1999, Pages 571-576

  Matsuzawa, Nobuyuki N ^a,b   Oizumi, Hiroaki ^a,c   Mori, Shigeyasu ^a,d   Irie, Shigeo ^a,e   Yano, Ei ^a,f   Okazaki, Shinji ^a,c   Ishitani, Akihiko ^a,g  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b SONY CORPORATION   (Japan)

^c HITACHI LTD   (Japan)

^d SHARP CORPORATION   (Japan)

^e PANASONIC CORPORATION   (Japan)

^f FUJITSU LABORATORIES LTD   (Japan)

^g NEC CORPORATION   (Japan)

Author keywords

EUV lithography; Linear absorption coefficient; Photoresist

Indexed keywords

EID: 0000820227     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.12.571     Document Type: Article

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