Modeling manufacturing yield and reliability

IEEE Transactions on Semiconductor Manufacturing

Volumn 12, Issue 4, 1999, Pages 485-492

  Kim, Taeho ^b   Kuo, Way ^a,c  

^a IEEE

^b KT Cooperation   (South Korea)

^c TEXAS A AND M UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL DEFECTS; GATES (TRANSISTOR); OXIDES; RELIABILITY; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR GROWTH;

GATE OXIDES;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0033342388     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.806126     Document Type: Article

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