Etch selectivity of novel epitaxial layers for bulk micromachining

Materials Research Society Symposium - Proceedings

Volumn 546, Issue , 1999, Pages 69-74

  Borenstein, J T ^a   Gerrish, N D ^a   Currffi, M T ^b   Fitzgerald, E A ^b  

^a CHARLES STARK DRAPER LABORATORY   (United States)

^b Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; DIFFUSION IN SOLIDS; ETCHING; PRECIPITATION (CHEMICAL); SEMICONDUCTING BORON; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DOPING; SUBSTRATES;

BULK MICROMACHINING;

MICROMACHINING;

EID: 0033341249     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)

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