Structural characterization of p++ Si:B layers for bulk micromachining

Materials Research Society Symposium - Proceedings

Volumn 444, Issue , 1997, Pages 197-202

  Wu, K C ^a   Shay, P A ^a   Borenstein, J T ^a   Fitzgerald, E A ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CHARACTERIZATION; COMPUTER SIMULATION; DIFFUSION; DISLOCATIONS (CRYSTALS); ETCHING; LATTICE CONSTANTS; MICROMACHINING; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

ETCH MORPHOLOGY; LATTICE MISMATCH STRESS; MICROTECHNOLOGY PROCESS SIMULATION PACKAGE; MODIFIED SCHIMMEL ETCHING; THREE DIMENSIONAL DISLOCATION ARRAY;

SEMICONDUCTING SILICON;

EID: 0030682257     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)