Silicon-based epitaxial films for MEMS

Materials Research Society Symposium - Proceedings

Volumn 518, Issue , 1998, Pages 233-238

  Fitzgerald, E A ^a   Wu, K C ^a   Currie, M ^a   Gerrish, N ^a   Bruce, D ^a   Borenstein, J ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; COMPOSITION; EPITAXIAL GROWTH; ETCHING; MATHEMATICAL MODELS; MECHANICAL PROPERTIES; MICROMACHINING; PASSIVATION; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON; SOLUBILITY; TRANSMISSION ELECTRON MICROSCOPY;

DISLOCATION DENSITY; ENERGY BAND STRUCTURE; LATTICE MISMATCH STRESS;

MICROELECTROMECHANICAL DEVICES;

EID: 0032293328     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)